M. B. Stern, Binary optics fabrication, Chap. 3 in Micro-optics: elements, systems and applications, H. P. Herzig, pp.53-86, 1997.

N. Dumbravescu, Experiments for 3-D structuring of thick resists by gray tone lithography, Materials Science in Semiconductor Processing, vol.3, pp.569-573, 2000.

H. Yu, B. Li, and X. Zhang, Flexible fabrication of three-dimensional multi-layered microstructures using a scanning laser system, Sensors and Actuators A, vol.125, pp.553-564, 2006.

N. Matsuzuka, Y. Hirai, and O. Tabata, A novel fabrication process of 3D microstructures by double exposure in deep x-ray lithography (D 2 XRL), J. Micromech. Microeng, vol.15, pp.2056-2062, 2005.

N. Yamazaki, T. Yamaguchi, and H. Namatsu, Three-dimensional nanofabrication with 10-nm resolution, Jpn. J. Appl. Phys, vol.43, issue.8B, pp.1111-1113, 2004.

T. Osipowicz, J. A. Van-kan, T. C. Sum, J. L. Sanchez, and F. Watt, The use of photon microbeam for the production of microcomponents, Nucl. and Meth. B, pp.83-83, 2000.

H. Martinsson, T. Sandstrom, A. Bleeker, and J. D. Hintersteiner, Current status of optical maskless lithography, J. Microlith., Microfab., Microsyst, vol.4, issue.1, p.11003, 2005.

R. Menon, A. Patel, D. Gil, and H. I. Smith, Maskless lithography, Materials Today, vol.8, pp.26-33, 2005.

M. T. Gale, M. Rossi, H. Schütz, P. Ehbets, H. P. Herzig et al., Continuous-relief diffractive optical elements for two-dimensional array generation, Appl. Opt, vol.32, issue.14, pp.2526-2533, 1993.

F. Nikolajeff, S. Jacobsson, S. Hård, ?. A. Billman, L. Lundbladh et al., Replication of continuous-relief diffractive optical elements by conventional compact disc injection-molding techniques, Appl. Opt, vol.36, issue.20, pp.4655-4659, 1997.

Q. Peng, S. Liu, Y. Guo, B. Chen, J. Du et al., Real-time photolithography technique for fabrication of arbitrarily shaped microstructures, Opt. Eng, vol.42, issue.2, pp.477-481, 2003.

Y. Gao, T. Sheng, J. Chen, N. Luo, X. Qi et al., Research on high-quality projecting reduction lithography system based on digital mask technique, Optik, vol.116, pp.303-310, 2005.

L. Chi, G. Xiaowei, G. Fuhua, L. Boliang, D. Xi et al., Imaging Simulation of Maskless Lithography Using a DMD TM, Proc. SPIE, vol.5645, pp.307-314, 2005.

G. Tl-electronic,

H. Associates,

, KRFTech ltd. changes names to Jungo ltd

G. Miva-technologies,

P. Ehbets, M. Rossi, and H. P. Herzig, Continuous-relief fan-out elements with optimized fabrication tolerances, Opt. Eng, vol.34, issue.12, pp.3456-3463, 1995.

K. M. Johnson, D. J. Mcknight, and I. Underwood, Smart spatial light modulators using liquid crystals on silicon, IEEE Journal of Quant. Electr, vol.29, issue.2, pp.699-714, 1993.

D. Inc,

, Forth Dimension Displays Ltd

J. Bengtsson, Direct inclusion of the proximity effect in the calculation of kinoforms, Appl. Opt, vol.33, issue.22, pp.4993-4996, 1994.

M. Ekberg, F. Nikolajeff, M. Larsson, and S. Hård, Proximity-compensated blazed transmission grating manufacture with direct-writing, electron-beam lithography, Appl. Opt, vol.33, issue.1, pp.103-107, 1994.

L. Grella, E. D. Fabrizio, M. Gentili, M. Baciocchi, and R. Maggiora, Proximity correction for e-beam patterned sub-500nm diffractive optical elements, Microelectron. Eng, vol.35, pp.495-498, 1997.

H. Zhang, J. Morrow, and F. M. Schellenberg, Optical proximity correction: a detail comparison of techniques and their effectiveness, Microelectron. Eng, vol.41, pp.79-82, 1998.

J. Du, Q. Huang, J. Su, Y. Guo, and Z. Cui, New approaches to optical proximity correction in photolithography, Microelectron. Eng, vol.46, pp.73-76, 1999.

L. Veneklasen, U. Hofmann, L. Johnson, V. Boegli, and R. Innes, Runtime correction of proximity effects in raster scan pattern generator systems, Microelectron. Eng, vol.46, pp.191-195, 1999.

, Biographies Mélanie Kessels received her University degree and her M.Sc. in Physics Sciences from the University ofLì ege (BELGIQUE) in 2003 and 2005, respectively

. Dr, Kevin Heggarty received his B.A. in Natural Sciences from the University of

. Cambridge, He is now senior lecturer at the ENST Bretagne. His research interests include non-display applications of spatial light modulators, the design and fabrication of diffractive micro-optical elements and their applications in optical telecommunications and optical information processing 25 in general, (UK) in 1987, his M.Sc. in Telecommunications and Information Systems from the University of Essex (UK) in 1988 and his doctorate from the Ecole Nationale Supérieure des Télécommunications, 1991.